Method of manufacturing a semiconductor device having an...

Semiconductor device manufacturing: process – Semiconductor substrate dicing – Having specified scribe region structure

Reexamination Certificate

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Details

C438S401000, C438S975000, C257S797000, C257SE23179

Reexamination Certificate

active

10942828

ABSTRACT:
A method of manufacturing a semiconductor device includes providing a substrate and forming a projecting alignment mark. The substrate includes an insulating layer and a semiconductor layer on the insulating layer, and the substrate includes device areas and a scribe line area which surrounds the device area in the semiconductor layer. The projecting alignment mark is formed on the scribe line area.

REFERENCES:
patent: 5369050 (1994-11-01), Kawai
patent: 5869383 (1999-02-01), Chien et al.
patent: 6368936 (2002-04-01), Yoshida
patent: 6737315 (2004-05-01), Kuroi et al.
patent: 6821867 (2004-11-01), Matsuura et al.
patent: 2002/0182821 (2002-12-01), Yabe et al.
patent: 62-128118 (1987-10-01), None
patent: 63-308916 (1988-12-01), None
patent: 2001-307999 (2001-11-01), None
patent: 2002-353120 (2002-12-01), None

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