Method of manufacturing a semiconductor device

Semiconductor device manufacturing: process – Packaging or treatment of packaged semiconductor – Including contaminant removal or mitigation

Reexamination Certificate

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Details

C438S110000, C438S113000, C257SE21499

Reexamination Certificate

active

07985625

ABSTRACT:
A method of manufacturing a semiconductor device involves the steps of: forming a plurality of product formation areas each having a circuit and a plurality of first electrode pads over a main surface of a semiconductor wafer; arranging a plurality of second electrode pads with larger pitches than the first electrode pads in each of the product formation areas; segmenting the semiconductor wafer to separate the plural product formation areas and provide a plurality of semiconductor devices each having the circuit, the plural first electrode pads and the plural second electrode pads on a first surface; and cleaning foreign matter off the first surface of the semiconductor device after the step of segmenting the semiconductor devices.

REFERENCES:
patent: 5981361 (1999-11-01), Yamada
patent: 6039059 (2000-03-01), Bran
patent: 6100594 (2000-08-01), Fukui et al.
patent: 6111317 (2000-08-01), Okada et al.
patent: 6624504 (2003-09-01), Inoue et al.
patent: 7169691 (2007-01-01), Doan
patent: 2003/0015218 (2003-01-01), Bran
patent: 2002-305285 (2002-10-01), None
patent: 2000-0048763 (2000-07-01), None
Korean Official Action dated Feb. 17, 2011, for KR Application No. 10-2004-0076828.

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