Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1994-07-06
1996-02-27
Duda, Kathleen
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430311, 430396, G03F 720
Patent
active
054947804
ABSTRACT:
In a method of manufacturing a printed circuit board, a photoresist layer is formed on a three-dimensionally molded substrate through a conductive layer. A planar photomask which is provided with a mask pattern and a light-transmissive pattern is placed in front of the photoresist layer. A parallel light beam is radiated to the photomask in order to give to the photoresist layer an exposed pattern of an intended width "L" in correspondence to the light-transmissive pattern. In the present invention, the light-transmissive pattern is configured so as to satisfy the following relations:
REFERENCES:
patent: 4904569 (1990-02-01), Fukuda et al.
patent: 5168624 (1992-12-01), Shirai
Nakamoto Atsuhiro
Nakashima Kunji
Otani Ryuji
Suzuki Toshiyuki
Tezuka Yoshitaka
Duda Kathleen
Matsushita Electric & Works Ltd.
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