Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making named article
Patent
1989-08-31
1991-08-06
Kight, III, John
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making named article
430323, 430329, 430330, 430 20, G03C 500, C09K 1900, G02F 103
Patent
active
050377230
ABSTRACT:
A method of manufacturing a plasma display panel formed with electrodes and barrier ribs therebetween by a photoetching method.
The invention is a process for forming respectively, electrodes and barrier ribs on glass substrates by a photoetching method; and a process for spreading the pastes deposited of each material for said electrodes and barrier ribs, and removing said pastes on the watersoluble photosensitive resin.
According to the invention, the plasma display panel can be manufactured more precisely and elaborately and it becomes possible to make it larger in size, while at the same time, manufacturing loss can be further reduced.
REFERENCES:
patent: 4804615 (1989-02-01), Larson et al.
"Thick Film Fine Pattern Formation by a Photolithographic Process", by Watanabe, Proceedings of the 29th Electronics Components Conference, May, 1979.
Kight III John
Samsung Electron Device Co., Ltd.
Shelborne Kathryne E.
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