Method of manufacturing a micromachined thermal flowmeter

Details Method of manufacturing a micromachined thermal flowmeter Method of manufacturing a micromachined thermal flowmeter

1998-10-30

2000-10-31

Gulakowski, Randy

Etching a substrate: processes

Etching of semiconductor material to produce an article...

216 99, 438 54, 205656, G01F 168, H01L 21306

Patent

active

06139758&

ABSTRACT:
A method of manufacturing a micromachined thermal flowmeter is provided. The major manufacturing steps comprise forming an n-type region(s) in a p-type silicon wafer, forming heating and temperature sensing devices in the n-type region(s), converting the n-type region(s) into porous silicon by anodization in a HF solution, bonding the silicon wafer onto a glass plate using a polyimide layer as an adhesive layer, removing the porous silicon in a diluted base solution, and coating the heating and temperature sensing devices with a corrosion-resistant and abrasion-resistant material.

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