Radiation imagery chemistry: process – composition – or product th – Radiation modifying product or process of making – Radiation mask
Patent
1988-08-31
1990-08-07
Dees, Jose
Radiation imagery chemistry: process, composition, or product th
Radiation modifying product or process of making
Radiation mask
20419215, 20419228, 378 35, G03F 100
Patent
active
049467514
ABSTRACT:
A method is set forth of manufacturing a mask for radiation lithography having a mask support and a substrate, on which an absorber layer is provided to be structured according to a desired mask pattern. The absorber layer having a thickness preferably in the range of from 0.2 to 1.2 .mu.m of partly oxidized tungsten having an oxygen content in the range of from 21 to 29 at. % in the layer is deposited on the substrate, preferably by means of cathode sputtering.
REFERENCES:
patent: 4218503 (1980-08-01), Reekstin et al.
patent: 4719161 (1988-01-01), Kimura et al.
Munz et al., "Reactive High Rate Sputtering of Oxides", Thin Solid Films, 86 (1981) pp. 175-181.
Bruns Angelika
Gotze Waldemar
Harms Margret
Luthje Holger
Dees Jose
Miller Paul R.
U.S. Philips Corporation
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