Method of manufacturing a magnetic head

Details Method of manufacturing a magnetic head Method of manufacturing a magnetic head

1987-08-24

1990-10-02

Nguyen, Nam X.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419215, 20419223, C23C 1434

Patent

active

049604988

ABSTRACT:
A method for manufacturing a magnetic head having a sputtered soft magnetic gap region, in which the layer (5, 6) provided on the magnetic core halves (1, 2) is sputtered by means of a magnetron sputtering apparatus. By choosing the material composition of the alloy support--target--and by a suitable choice of the sputtering rates a layer having an increased magnetic property is sputtered on the magnetic core from a target having a weak magnetic property so that a larger material thickness can be chosen for the target.

REFERENCES:
patent: 3303292 (1967-02-01), Bedell, Jr. et al.
patent: 3566045 (1971-02-01), Paine
patent: 3829373 (1974-08-01), Kuehnle
patent: 4049522 (1977-09-01), Chinshie et al.
patent: 4415427 (1983-11-01), Hidler et al.
patent: 4569746 (1986-02-01), Hutchinson
patent: 4670807 (1987-06-01), Gorter et al.

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