Method of manufacturing a liquid crystal display device

Details Method of manufacturing a liquid crystal display device Method of manufacturing a liquid crystal display device

2007-11-27

2007-11-27

Smith, Zandra V. (Department: 2822)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

On insulating substrate or layer

C438S030000, C349S043000

Reexamination Certificate

active

11411137

ABSTRACT:
Disclosed is a photoresist film which is formed in a manner of covering at least a source electrode, a source line, a pixel electrode, a drain electrode, a drain line, a semiconductor film and a protective film, and further covering a gate insulting film in their vicinities. Moreover, wet and dry etchings are sequentially performed by using the photoresist film as a mask. Due to this etching, a residual pattern existing on the gate insulating film is etched.

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