Method of manufacturing a composite material

Details Method of manufacturing a composite material Method of manufacturing a composite material

1998-12-18

2000-08-29

Nguyen, Nam

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419216, C23C 1435

Patent

active

061103292

ABSTRACT:
In a method of manufacturing a composite material structure consisting of a substrate with a layer of essentially pure sp.sup.2 - and sp.sup.3 -hybridized carbon with a sp.sup.3 -hybridized carbon proportion which increases toward the surface of the carbon layer, the carbon layer is deposited on the substrate by a PVD process using a magnetron sputtering apparatus in a process chamber in which an argon partial pressure of 0.6 to 1.0 pa is maintained and, during the carbon deposition, a bias voltage is maintained which is increased with increasing thickness of the layer from 0 to 300 volts.

REFERENCES:
patent: 4822466 (1989-04-01), Rabalais et al.
patent: 5178739 (1993-01-01), Barnes et al.
Holmberg et al., "Tribological Characteristics of Hydrogenated and Hydrogen-free Diamond-like Carbon Coatings", Diamond Films and Technology, vol. 4, No. 2.

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