Method of manufacture of a soft-X-ray mask

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156236, 156246, 156278, 156632, 156633, 156634, 156643, 156656, 156657, 156663, 204192E, 250492R, 250492R, 250505, 427250, 427385A, G21F 504

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041705122

ABSTRACT:
A process for fabricating polyimide membrane x-ray lithography masks is described. Thin membrane of polyimide is formed by spinning polyamic acid on a glass substrate and polymerizing in situ. The glass substrate acts as a holder and efficient heat sink during formation of gold absorber patterns on top of the polyimide. A support ring is then bonded to the polyimide, and the glass etched in dilute HF. Optically smooth polyimide membranes with thicknesses from 0.5 to 5 .mu.m are readily achieved. The method and resulting product is not limited to the above materials or to masks.

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patent: 3607997 (1971-09-01), Linturn
patent: 3742230 (1973-06-01), Spears et al.
patent: 3767494 (1973-10-01), Muroqka et al.
patent: 3873824 (1975-03-01), Bean et al.
patent: 3892973 (1975-07-01), Coquin et al.
patent: 3930914 (1976-01-01), Hetrich
patent: 4037111 (1977-07-01), Coquin et al.

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