Method of making x-ray masks

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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Details

156657, 2505051, 430 5, B44C 122, C03C 1500, C03C 2506

Patent

active

043849199

ABSTRACT:
An x-ray mask is made by forming a thin polyimide membrane on a silicon wafer substrate which is then back-etched to form a mask supporting ring of the substrate.

REFERENCES:
patent: 3742230 (1973-06-01), Spears et al.
patent: 3841930 (1974-10-01), Hetrich
patent: 4037111 (1977-07-01), Coquin et al.
patent: 4170512 (1979-10-01), Flanders et al.

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