Method of making X-ray mask having reduced stress

Details Method of making X-ray mask having reduced stress Method of making X-ray mask having reduced stress

1996-02-21

1997-10-14

Rosasco, S.

Radiation imagery chemistry: process, composition, or product th

Radiation modifying product or process of making

Radiation mask

430313, 378 34, 378 35, G03F 900

Patent

active

056770901

ABSTRACT:
A method of making a X-ray mask including: a step of forming a X-ray absorber above a substrate; a step of controlling a stress of the X-ray absorber by a predetermined condition; and wherein the predetermined condition for controlling the stress of the X-ray absorber formed above the substrate is determined by a measured value of a stress of a X-ray absorber formed on a monitor substrate.

REFERENCES:
patent: 4873162 (1989-10-01), Yoshioka et al.
patent: 5124561 (1992-06-01), Faure et al.
patent: 5132186 (1992-07-01), Takeuchi et al.
patent: 5188706 (1993-02-01), Hori et al.
patent: 5500312 (1996-03-01), Harriott et al.
patent: 5541023 (1996-07-01), Kondo et al.
SPIE-The International Society for Optical Engineering, "Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing IV", vol. 2194, pp. 221-130 Jan. 1994.

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