Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1992-02-06
1992-12-15
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
427164, 427166, 427167, 156 99, C23C 1434
Patent
active
051714140
ABSTRACT:
An anti-reflective coating employing silicon as a high refractive index material in a film pair together with silicon dioxide as a low refractive index material is found to be substantially transparent to visible light and to provide good anti-reflectance where the silicon film is ultra-thin, preferably less than about 50 Angstroms and the thickness of the silicon dioxide film is matched to that of the silicon film. Laminated glazing units having such anti-reflective film can be used, for example, even in applications requiring high transmittance of visible light, such as motor vehicle windshields, in view of the substantial transparency of the coating.
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Amberger Charles J.
Demiryont Hulya
Nietering Kenneth E.
Ellerbrock Charles H.
Ford Motor Company
May Roger L.
Weisstuch Aaron
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