Method of making three dimensional semiconductor devices in sele

Metal treatment – Compositions – Heat treating

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29576B, 29576T, 148187, 427 531, 357 91, H01L 21265, H01L 2126

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active

046094075

ABSTRACT:
Herein disclosed is a semiconductor device having at least one lower resistance region formed in the single-crystalline semiconductor film which is so formed to continuously coat both a single-crystalline semiconductor substrate and an insulating film formed on the surface of the substrate.
Since the aforementioned single-crystalline semiconductor film is used, many advantages which are not attained from the semiconductor device according to the prior art can be obtained.
The aforementioned single-crystalline semiconductor film is formed by irradiating a polycrystalline or amorphous semiconductor film with a laser beam.

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