Method of making thin-layer component

Details Method of making thin-layer component Method of making thin-layer component

1994-06-07

1996-04-30

Weisstuch, Aaron

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

20419212, 20429806, 20429811, C23C 1434

Patent

active

055121519

ABSTRACT:
The present invention relates to a thin-layer component having a thin layer of (100)-oriented platinum or the other metals in Group VIII, which is formed on amorphous silicon dioxide, and further relates to a thin-layer producing system for producing such thin-layer components, the thin-layer producing system being a sputtering system wherein an auxiliary electrode is provided between two electrodes.

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"Pyroelectric Linear Array Infrared Sensors Made of c-axis-oriented La-modified PbTiO.sub.3 Thin Films", J. Appl. Phys., vol. 63, No. 12, Jun. 15, 1988, pp. 5868-5872.
"Preparation and Switching Kinetics of Pb(Zr, Ti).sub.3 Thin Films Deposited by Reactive Sputtering", Japanese J. Appl. Phys., vol. 30, No. 9B, Sep. 1991, pp. 2159-2162.
"Oxygen Induced Preferred Orientation of dc Sputtered Platinum", J. Vac. Scl. Technol., vol. 18, No. 2, Mar. 1981, pp. 219-222.

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