Method of making surface wave devices

Details Method of making surface wave devices Method of making surface wave devices

1997-04-24

1999-10-26

Duda, Kathleen

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430394, 430313, G03F 720

Patent

active

059725680

ABSTRACT:
A surface wave device is made by forming conductors on a surface of a piezoelectric material in a conductor pattern defined by exposing photoresist via a reticle. The conductor pattern is provided on the reticle in two parts each defining a set of substantially alternate fingers of the pattern, and the photoresist is exposed by two overlaid exposures each via a respective one of the two parts of the conductor pattern. Exposed photoresist can optionally be developed between the two exposures, and conductors can optionally be formed on the surface between the two exposures. The method reduces diffraction limits, permitting manufacture of surface wave devices with sub-micron linewidths for filtering at increased frequencies.

REFERENCES:
patent: 4690880 (1987-09-01), Suzuki et al.
patent: 5344745 (1994-09-01), Yamanouchi
patent: 5563012 (1996-10-01), Neisser
patent: 5604059 (1997-02-01), Imura et al.
"Surface Mount Type SAW Filter for Hand-held Telephones", S. Suma et al., Proc. of the Japan International Electronic Manufacturing Technology Symposium (Japan IEMT), IEEE, XP000268493, pp. 97-200, Jun. 9, 1993.
"Fabrication of 0.25 .mu.m Surface Acoustic Wave Devices by Ion Beam Proximity Printing", D.P. Stumbo et al., Journal of Vacuum Science and Technology, Part B, vol. 9, No. 7, XP000506040, pp. 2879-2881, Nov. 1, 1991.

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