Method of making reference surface markings on semiconductor waf

Details Method of making reference surface markings on semiconductor waf Method of making reference surface markings on semiconductor waf

1984-04-26

1985-06-11

Roy, Upendra

Metal treatment

Compositions

Heat treating

29574, 29576T, 148187, 156644, 427 531, H01L 21265, B23K 2700

Patent

active

045226563

ABSTRACT:
A method for producing contrast rich, permanent and slag-free characterizations, particularly on polished semiconductor disks is described, in which the surface for generating the surface pattern is partially melted by laser radiation. According to the invention, a surface segment corresponding to 1.5 to 6.5 times the surface area of the desired surface pattern is irradiated, and the semiconductor material is caused to melt and partially vaporize only in the center thereof.

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