Method of making patterned metal oxide films comprising a sol-ge

Details Method of making patterned metal oxide films comprising a sol-ge Method of making patterned metal oxide films comprising a sol-ge

1989-12-26

1992-03-31

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making electrical device

430326, 430330, 430165, 428901, 4271263, 427272, G03F 732, G03F 740, B05D 132

Patent

active

051007649

ABSTRACT:
A method of making patterned metal oxide films on microelectronic wafer substrates. They are prepared by making a sol-gel of a metal oxide in combination with an ultraviolet light sensitive photo-active compound. The sol-gel is applied to a silicon wafer substrate, and the wafer subjected to a predetermined pattern of ultraviolet light to cause the photo-active compound to respond to the ultraviolet light. The wafer is thereafter aqueous alkali metal hydroxide washed to wash away the portions of the metal alkoxide film which have been exposed to UV light.

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