Method of making memory devices

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

156645, 1566591, 156 69, G11C 1300

Patent

active

047402660

ABSTRACT:
A method for making an optical memory storage medium which has a transparent substrate with void cells of empty spaces and ablative material on the cell walls is disclosed. In one example, a base plate is coated with a masking layer. Pits are formed on the plate by mechanically stamping the masking layer and the base plate with a punch. A layer of ablative material is next applied on the pitted plate. The masking layer is then removed, together with any ablative material on it. The base plate is joined with a cover plate that seals the top of the pits to form void cells. In another example, a base plate is coated with a photo resist. The photo resist is exposed and developed. Pits are formed on the plate by etching the uncovered areas of the base plate. This is followed by the application of ablative material and the removal of the photo resist. The base plate is joined with a cover plate that seals the top of the pits to form void cells.

REFERENCES:
patent: 3923566 (1975-12-01), Law
patent: 3980461 (1976-09-01), Moeckel
patent: 4081314 (1978-03-01), Smith
patent: 4126854 (1978-11-01), Sheridon
patent: 4247361 (1981-01-01), Shaheen
patent: 4256533 (1981-03-01), Mayer
patent: 4323420 (1982-04-01), Masnari
patent: 4532608 (1985-07-01), Wu
Nickols et al; IBM Technical Disclosure Bull., vol. 20, No. 8, 1-1978, pp. 3307-3308.
Marks et al; IBM Technical Disclosure Bull., vol. 25, No. 11A, 4-1983, pp. 5523-5524.
Patents Abstracts of Japan, vol. 5, No. 165 (P-85) [837], Oct. 22, 1981; and JP-A-59 94 529, (Fujitsu K.K.) 07-31-1981.
Patents Abstracts of Japan, vol. 7, No. 287 (M-264) [1432], Dec. 21, 1983; and JP-A-58 162 387 (Canon K.K.) 09-27-1983.
Proceedings of the IEEE, vol. 61, No. 2, Feb. 1973, pp. 148-153, IEEE, New York, U.S.; G. W. Taylor: "A Liquid-Vapor Display".
Transistor Technology, vol. III; Edited by F. J. Biondi; D. Van Nostrand Company, Inc., Princeton, N.J.; 1958; pp. 160-161.
Handbook of Thin Film Technology; Edited by L. I. Maissel et al; McGraw Hill Book Company, N.Y.; 1970; pp. 7-48 and 7-49.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of making memory devices does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of making memory devices, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making memory devices will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-818044

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.