Method of making low .kappa. dielectric inorganic/organic hybrid

Details Method of making low .kappa. dielectric inorganic/organic hybrid Method of making low .kappa. dielectric inorganic/organic hybrid

1998-04-28

2000-05-30

King, Roy V.

Coating processes

Coating by vapor, gas, or smoke

Organic coating applied by vapor, gas, or smoke

427515, 427578, 427 99, C23C 1600, C08J 704

Patent

active

06068884&

ABSTRACT:
A method of depositing a dielectric film exhibiting a low dielectric constant in a semiconductor and/or integrated circuit by chemical vapor deposition (CVD) is provided. The film is deposited using an organosilicon precursor in a manner such that the film is comprised of a backbone made substantially of Si--O--Si or Si--N--Si groups with organic side groups attached to the backbone.

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