Method of making image reproducing material having scratch impro

Details Method of making image reproducing material having scratch impro Method of making image reproducing material having scratch impro

1987-01-08

1988-04-26

Brammer, Jack P.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430281, 430523, 430950, 430961, 522 16, 522 78, 522 79, 522121, 522 26, 524322, 524533, 524318, 524230, 524250, 524385, G03C 168

Patent

active

047404507

ABSTRACT:
An image reproducing material which comprises a support and at least a photosensitive resin layer and scratch resistance layer borne on the support, said scratch resistance layer containing a compound represented by AmBn, wherein A is mono- or divalent, straight or branched C.sub.11-20 aliphatic hydrocarbon; B is hydrogen, hydroxyl, amino, nitrile, aldehyde, carboxyl, or alkylamide, alkylester, ammonium salt or a periodic table group I-IV metal salt of a carboxylic acid; m is an integer of 1 to 3; and n is 1 or 2. A process for preparing the image reproducing material as well as a process for preparing an image reproduced material by using the image reproducing material are also described.

REFERENCES:
patent: 3203805 (1965-08-01), Burg
patent: 3895949 (1975-07-01), Akamatsu
patent: 4013696 (1977-03-01), Babbitt et al.
patent: 4069053 (1978-01-01), Mayama
patent: 4142894 (1979-03-01), Hori et al.
patent: 4333998 (1982-06-01), Leszyk
patent: 4347303 (1982-08-01), Asano et al.

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