Method of making hard, transparent amorphous hydrogenated boron

Details Method of making hard, transparent amorphous hydrogenated boron Method of making hard, transparent amorphous hydrogenated boron

1994-06-16

1996-05-21

King, Roy V.

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

427570, 427561, 4272552, B05D 306

Patent

active

055187803

ABSTRACT:
This invention is directed to a process for providing a hard, transparent, hydrophobic film of hydrogenated boron nitride on a substrate and the film so made. The process comprises depositing the film condensation from a flux of ions generated from gaseous precursors comprising borazine, the kinetic energy of the ions being between 50 and 300 electron volts per ion. Preferably the process is plasma-enhanced chemical vapor deposition carried out in a radio frequency plasma system.

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