Semiconductor device manufacturing: process – Semiconductor substrate dicing
Reexamination Certificate
2005-04-19
2005-04-19
Niebling, John F. (Department: 2812)
Semiconductor device manufacturing: process
Semiconductor substrate dicing
C438S068000, C438S458000, C438S753000, C359S900000
Reexamination Certificate
active
06881649
ABSTRACT:
A plurality of micromirror chips are collectively made from a common substrate. Each of the micromirror chips is formed with a micromirror unit including a frame, a mirror-forming portion separate from the frame via spaces, and torsion bars connecting the mirror-forming portion to the frame. The common substrate is subjected to etching to provide the spaces and make division grooves for dividing the common substrate into the individual micromirror chips. The etching for the spaces and the etching for the division grooves are performed in parallel with each other.
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Kouma Norinao
Mizuno Yoshihiro
Nakamura Yoshitaka
Okuda Hisao
Sawaki Ippei
Fujitsu Limited
Fujitsu Media Devices Limited
Niebling John F.
Roman Angel
Staas & Halsey , LLP
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