Method of making atomically sharp tips useful in scanning probe

Details Method of making atomically sharp tips useful in scanning probe Method of making atomically sharp tips useful in scanning probe

1992-05-15

1994-04-12

Dang, Thi

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156646, 1566591, 1566611, 156657, 156662, 250306, 250311, G21K 700

Patent

active

053022394

ABSTRACT:
An in situ plasma dry etching process for the formation of atomically sharp tips for use in high resolution microscopes in which i) a mask layer is deposited on a substrate, ii) a photoresist layer is patterned superjacent the mask layer at the sites where the tips are to be formed, iii) the mask is selectively removed by plasma etching, iv) after which the substrate is etched in the same plasma reacting chamber, thereby creating sharp microscope tips.

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