Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1996-08-16
1998-07-21
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419226, 20419227, 2041923, 359585, 359586, 359589, 428216, 428332, 428336, C23C 1434
Patent
active
057830495
ABSTRACT:
An improved way to impart antireflection properties to light transmissive substrates and, at the same time, achieve a durable surface and electrical conductivity is disclosed. A stack of at least two sputter-deposited light transmissive inorganic layers, one of which being electrically conductive and having a high index of refraction with the one above it (relative to the substrate being antireflected) having a low index of refraction, in combination with a thin lubricating overlayer comprising a solvent-soluble lubricant such as a solvent-soluble fluoropolymer can achieve this desired combination of properties.
REFERENCES:
patent: 4194022 (1980-03-01), Gillery
patent: 4828346 (1989-05-01), Jacobson et al.
patent: 5091244 (1992-02-01), Biornard
patent: 5105310 (1992-04-01), Dickey
patent: 5245468 (1993-09-01), Demiryont et al.
patent: 5270858 (1993-12-01), Dickey
patent: 5362552 (1994-11-01), Austin
patent: 5372874 (1994-12-01), Dickey et al.
patent: 5407733 (1995-04-01), Bjornard et al.
patent: 5494743 (1996-02-01), Woodard et al.
patent: 5579162 (1996-11-01), Bjornard et al.
Bright Clark I.
Kozak Julius G.
Pace Steven J.
Woodard F. Eugene
McHugh Terry
Southwall Technologies Inc.
Weisstuch Aaron
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