Method of making an embossed pattern on an information bearing s

Details Method of making an embossed pattern on an information bearing s Method of making an embossed pattern on an information bearing s

1979-06-11

1981-09-08

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Simultaneous radiation imaging and etching of substrate

156643, 156659, 156664, 346 76L, 427 431, 427 531, 427271, 430 5, 430296, 430323, 430325, 430326, 430394, 430502, 430945, G03C 500

Patent

active

042885280

ABSTRACT:
An improved process for forming an embossed pattern through the use of a writing concentrated beam opening holes in a film capable of undergoing residue free evaporation. A layer of photoresist is overlayed with the film and upon being exposed and processed the layer supplies the prospective embossed pattern.

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patent: 3924093 (1975-12-01), Feldman et al.
Kodak Autopositive Resist, Type 3; 1969.

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