Method of making a thin film transistor device

Details Method of making a thin film transistor device Method of making a thin film transistor device

2005-10-03

2008-07-29

Hu, Shouxiang (Department: 2811)

Semiconductor device manufacturing: process

Making passive device

Planar capacitor

C438S030000, C438S149000, C438S155000

Reexamination Certificate

active

07405132

ABSTRACT:
In a semiconductor device having a substrate which has a metal surface, an insulating film which is formed on the substrate having the metal surface, and a pixel unit which is formed on the insulating film; the pixel unit includes a TFT, and wiring lines connected with the TFT, and a storage capacitor is constituted by the substrate (11) having the metal surface, the insulating film (12), and the wiring line (21). As the insulating film is thinner, and as the area of a region where the insulating film and the wiring line lie in contact is larger, the storage capacitor is endowed with a larger capacity.

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