Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1987-08-10
1989-11-14
McDowell, Robert
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
427131, 427132, C23C 1434
Patent
active
048805149
ABSTRACT:
A new high quality, low cost, thin-film magnetic recording member is provided, which has a coercive field strength greater than 650 Oe, a saturation magnetization greater than 10,000 Gauss, and a squareness ratio of 0.9 or larger. The member includes a substrate on which is directly sputter deposited a chromium layer, without the use of an intervening nickel-containing layer between the substrate and the chromium. A nickel-cobalt recording layer is then sputter deposited directly onto the chromium layer. In the preferred mode, the start of that nickel-cobalt deposition begins less than 100 seconds after the chromium deposition is terminated and is followed by the sputtering of a protective layer. Before the chromium deposition, the substrate is preheatead to drive off adsorbed gases, and to establish the proper conditions for the chromium deposition. The substrate is also heated during the time between when the chromium deposition ends and the nickel-cobalt deposition begins.
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Li Eric K.
Scott John C.
Viswanathan Nal T.
Washburn Hudson A.
Akshic Memories Corporation
McDowell Robert
Smith Joseph H.
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