Method of making a semiconductor device

Details Method of making a semiconductor device Method of making a semiconductor device

1996-09-20

1999-07-20

Niebling, John F.

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

438634, 438624, 438638, 438637, 438700, 438734, 438740, H01L 214763

Patent

active

059267321

ABSTRACT:
Disclosed herein is a method of making a semiconductor device, which can effectively prevent a lower insulating layer from formation of a recess resulting from etching during formation of a groove for connecting interconnection layers with each other. In this method of making a semiconductor device, a first etching prevention film is formed on a first interlayer insulating film, so that a second interlayer insulating film is formed on the first etching prevention film.

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