Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1997-11-21
2000-01-11
Nguyen, Nam
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419221, C23C 1434
Patent
active
060131608
ABSTRACT:
The nucleation efficiency of a thermal ink jet printhead is improved by providing a heater resistor with a thin planar oxide film formed over a conductive heater resistive layer. In a preferred embodiment, zirconium diboride is sputtered onto a silicon substrate surface to form a first, electrically conductive base portion of the resistor. At a predetermined time, during the sputtering process, oxygen is introduced to form a thin film of ZrB.sub.2 O.sub.x. The surface of this film is very smooth having a surface roughness of <5 nm RMS.
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Michael O'Horo et al. entitled "Effect of TIJ Heater Surface Topology on Vapor Bubble Nucleation", SPIE Journal, vol. 2658, pp. 58-64, Jan. 29, 1996.
Burke Cathie J.
Raisanen Alan D.
Cantelmo Gregg
Nguyen Nam
Xerox Corporation
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