Method of making a negative exposure mask

Details Method of making a negative exposure mask Method of making a negative exposure mask

1977-10-31

1979-11-13

Kimlin, Edward C.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Making named article

1566591, 156656, 1566661, 427164, 427165, 427250, 427255, 427259, G03C 500, C23F 102, G03C 550, B32B 3128

Patent

active

041742192

ABSTRACT:
A negative exposure mask is prepared by forming a positive mask image of a first metal layer on a transparent substrate and applying a layer of resist which is exposed through the back of the substrate and developed to form a lift-off mask. The lift-off mask is used to form a negative mask image of a second layer of metal on the substrate in the areas not covered by the first metal layer. The first metal layer is then etched away to leave the negative mask image on the substrate.

REFERENCES:
patent: 3615462 (1971-10-01), Szegho et al.
patent: 3661580 (1972-05-01), Mayaud
patent: 3669665 (1972-06-01), Faigenbaum et al.
patent: 3712816 (1973-01-01), Blome et al.
patent: 3745094 (1973-07-01), Greene
patent: 3878007 (1975-04-01), Feldstein et al.
patent: 4018938 (1977-04-01), Feder et al.

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