Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device
Patent
1992-05-26
1993-11-30
McCamish, Marion E.
Radiation imagery chemistry: process, composition, or product th
Imaging affecting physical property of radiation sensitive...
Making electrical device
430313, 430315, 430317, 156643, 437183, 437203, 437225, 437228, 437229, G03C 500, H01L 21283
Patent
active
052664465
ABSTRACT:
A method of making a multilayer thin film structure on the surface of a dielectric substrate which includes the steps of:
REFERENCES:
patent: 4451326 (1984-05-01), Gwozdz
patent: 4572764 (1986-02-01), Fan
patent: 4622058 (1986-11-01), Leary-Renick et al.
patent: 4631111 (1986-12-01), Williston
patent: 4789648 (1988-12-01), Chow et al.
patent: 4816115 (1989-03-01), Horner et al.
patent: 4944836 (1990-07-01), Beyer et al.
patent: 5091339 (1992-02-01), Carey
Shaw, et al., Entitled "Photosensitive Glass for Producing Recessed Metallurgy, Eliminating Need for Planarazation", IBM Technical Disclosure Bulletin, vol. 26, No. 3A, p. 1094 (Aug. 1983).
Chang Kenneth
Czornyj George
Farooq Mukta S.
Kumar Ananda H.
Pitler Marvin S.
Blecker Ira David
Duda Kathleen
International Business Machines - Corporation
McCamish Marion E.
LandOfFree
Method of making a multilayer thin film structure does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of making a multilayer thin film structure, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of making a multilayer thin film structure will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2094867