Method of making a multilayer thin film structure

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

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430313, 430315, 430317, 156643, 437183, 437203, 437225, 437228, 437229, G03C 500, H01L 21283

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052664465

ABSTRACT:
A method of making a multilayer thin film structure on the surface of a dielectric substrate which includes the steps of:

REFERENCES:
patent: 4451326 (1984-05-01), Gwozdz
patent: 4572764 (1986-02-01), Fan
patent: 4622058 (1986-11-01), Leary-Renick et al.
patent: 4631111 (1986-12-01), Williston
patent: 4789648 (1988-12-01), Chow et al.
patent: 4816115 (1989-03-01), Horner et al.
patent: 4944836 (1990-07-01), Beyer et al.
patent: 5091339 (1992-02-01), Carey
Shaw, et al., Entitled "Photosensitive Glass for Producing Recessed Metallurgy, Eliminating Need for Planarazation", IBM Technical Disclosure Bulletin, vol. 26, No. 3A, p. 1094 (Aug. 1983).

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