Method of making a cantilever stylus for use in an atomic force

Details Method of making a cantilever stylus for use in an atomic force Method of making a cantilever stylus for use in an atomic force

1991-11-29

1993-02-16

Powell, William A.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156643, 156653, 156657, 156662, 156904, H01L 21306, B44C 122, C03C 1500, C23F 100

Patent

active

051867893

ABSTRACT:
A cantilever stylus suited for use in an atomic force microscope is made in the following processes: forming a first film on a substrate; forming a second film of metallic material on an external surface of the first film; forming a photoresist film on an external surface of the second film by making use of a photolithography technique; performing etching with respect to the second film with only a portion thereof covered with the photoresist film left on the first film; and further performing etching with respect to the first film with the second film being used as a resist film so that the first film may be configured into a cantilever stylus.

REFERENCES:
patent: 4943719 (1990-07-01), Akamine et al.
"Microfabrication of Cantilever Styli for the Atomic Force Microscope", Albrecht et al., Journal of Vacuum/Science and Technology, Jul./Aug., No. 4.
"Use of Gold Films as Masks for a KOH Preferential Etch", Ogita et al., Thin Solid Films, 120(1984), pp. L79-81.
"Improved Atomic Force Microscope Images Using Microcantilevers with Sharp Tips", Akamine et al., Applied Physics Letters, 57(3), Jul. 16, 1990.
"Fabrication of Nanostructure by Anisotropic Wet Etching of Silicon", Shimuzu et al., Japanese Journal of Applied Physics, vol. 27, No. 9, Sep. 9, 1988, pp. L1778-L1779.
"CR-P/Si Thin Film Cantilever Structures", IBM Technical Disclosure Bulletin, vol. 33, No. 1B, Jun., 1990.

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