Method of making a bolometric radiation detector

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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29573, 156652, 156656, 1566591, 1566611, 156901, 204192E, 250338, 357 29, C23F 102, B44C 122, C03C 1500, C03C 2506

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045444412

ABSTRACT:
A bolometric radiation detector wherein the electrically-conductive measuring layer is applied to a carrier film which is supported by a frame. To produce a bolometer of this type the carrier film is produced as a layer on a base material, preferably by anodic or thermal oxidation of the base material. The measuring layer is applied to the carrier film. After providing the base material and the measuring layer with a photoresist layer, the conductors are etched out and a window is made from the reverse side. The carrier film with the measuring layer structure then remains. The parts of the base material that have not been removed serve as a frame for the carrier film.

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patent: 4061917 (1977-12-01), Goranson et al.
patent: 4070230 (1978-01-01), Stein
"Hochempfindliches Bolometer", Elektronik, May 1979, (one page).
Khambata, Adi J., Adi. "Introduction to Integrated Semiconductor Circuits", John Wiley and Sons, Inc., (1963), pp. 24 to 26.
Tickle, Andrew C., "Thin-Film Transistors", John Wiley and Sons, Inc. (1969), pp. 74 to 75.
Broyde, Barrett, "Exposure of Photoresists II, Electron and Light Exposure of a Positive Photoresist", J. Electrochem. Soc., Solid State Science, vol. 117, No. 12, (Dec. 1970), pp. 1555 and 1556.
Magill, P. J., et al., "Photometallic Etching of Holograms", J. Electrochem. Soc., Solid State Science, vol. 118, No. 9, (Sep. 1971), pp. 1514 to 1516.
Blakemore, J. S., et al., "Shaping of Bulk Semiconductor Samples by Photolithography and Chemical Etching", J. Electrochem. Soc., Solid-State Science and Technology, vol. 128, No. 11, (Nov. 1981), pp. 2410 to 2415.

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