Method of maintaining a strong endpoint detection signal for RIE

Details Method of maintaining a strong endpoint detection signal for RIE Method of maintaining a strong endpoint detection signal for RIE

1996-06-14

1997-10-21

Nguyen, Nam

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

134 1, 134 11, B08B 700

Patent

active

056792140

ABSTRACT:
A method of maintaining a strong endpoint detection signal, for RIE processes, has bean developed. After numerous RIE procedures have been performed, in a specific RIE chamber, an insitu dry cleaning procedure is implemented to remove polymer from a window in the RIE tool, a window that is used for monitoring endpoint. The insitu dry cleaning procedure is performed using oxygen or chlorine, in the etching chamber of a single wafer RIE tool, while wafers, waiting to be etched, reside in a different chamber of the single wafer RIE tool. The ability to insitu dry clean, results in little interruption in the utilization of the etching function of this tool.

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