Semiconductor device manufacturing: process – Semiconductor substrate dicing – By electromagnetic irradiation
Reexamination Certificate
2005-12-14
2008-12-23
Zarneke, David A (Department: 2891)
Semiconductor device manufacturing: process
Semiconductor substrate dicing
By electromagnetic irradiation
C257SE21599
Reexamination Certificate
active
07468310
ABSTRACT:
A method of machining a substrate etches a substrate according to a predetermined length and depth from an intersection between a first predetermined dividing line and a second predetermined dividing line, which cross each other in a T-shaped line, along the second predetermined dividing line of the predetermined dividing lines being used to cut the substrate, and divides the substrate along the predetermined dividing lines which are not etched by laser machining.
REFERENCES:
patent: 6121118 (2000-09-01), Jin et al.
patent: 2002-192367 (2002-07-01), None
patent: 2002-205180 (2005-07-01), None
Umetsu Kazushige
Yamazaki Yutaka
Harness & Dickey & Pierce P.L.C.
Seiko Epson Corproation
Zarneke David A
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