Method of machining substrate and method of manufacturing...

Semiconductor device manufacturing: process – Semiconductor substrate dicing – By electromagnetic irradiation

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C257SE21599

Reexamination Certificate

active

07468310

ABSTRACT:
A method of machining a substrate etches a substrate according to a predetermined length and depth from an intersection between a first predetermined dividing line and a second predetermined dividing line, which cross each other in a T-shaped line, along the second predetermined dividing line of the predetermined dividing lines being used to cut the substrate, and divides the substrate along the predetermined dividing lines which are not etched by laser machining.

REFERENCES:
patent: 6121118 (2000-09-01), Jin et al.
patent: 2002-192367 (2002-07-01), None
patent: 2002-205180 (2005-07-01), None

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Method of machining substrate and method of manufacturing... does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method of machining substrate and method of manufacturing..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of machining substrate and method of manufacturing... will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-4041488

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.