Method of limiting sticking of body to susceptor in a deposition

Details Method of limiting sticking of body to susceptor in a deposition Method of limiting sticking of body to susceptor in a deposition

1993-06-21

1995-01-10

Padgett, Marianne

Coating processes

Direct application of electrical, magnetic, wave, or...

Pretreatment of substrate or post-treatment of coated substrate

427535, 427569, 156643, B05D 306

Patent

active

053805666

ABSTRACT:
A method of limiting sticking of a body (substrate) to a susceptor after the body has been coated with a layer in a deposition chamber by plasma chemical vapor deposition includes subjecting the coated body to a plasma of an inactive gas, e.g., hydrogen, nitrogen, argon or ammonia, which does not adversely affect the coating and does not add additional layers to the body. After the coated body is subjected to the plasma of the inactive gas, the body is separated from the susceptor.

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patent: 5223457 (1993-06-01), Mintz et al.

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