Method of light induced plating on semiconductors

Details Method of light induced plating on semiconductors Method of light induced plating on semiconductors

2011-06-07

2011-06-07

Pham, Thanhha (Department: 2894)

Semiconductor device manufacturing: process

Coating with electrically or thermally conductive material

To form ohmic contact to semiconductive material

C438S674000, C257SE21586

Reexamination Certificate

active

07955977

ABSTRACT:
Methods of light induced plating of nickel onto semiconductors are disclosed. The methods involve applying light at an initial intensity for a limited amount of time followed by reducing the intensity of the light for the remainder of the plating period to deposit nickel on a semiconductor.

REFERENCES:
patent: 4451969 (1984-06-01), Chaudhuri

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