Method of laser patterning an electrical interconnect

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step

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156643, 156652, 156644, 156656, 156657, 1566591, 1566611, 156662, 156668, 21912185, 357 71, 437192, 437194, 437198, 437199, 437246, H01L 71306, B44C 122, C03C 1500, C23F 102

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049832506

ABSTRACT:
Forming an electrical interconnect by applying an adhesion layer over a substrate, applying an electrical conductor layer over the adhesion layer, and applying a reacting layer over the electrical conductor layer. A laser beam is directed over the reacting layer in a desired pattern to interdiffuse the reacting and conductor layers and form a reaction product. The reaction product is used as an etch mask for etching away the reacting layer, the conductor layer, and the adhesion layer outside of the reaction product.

REFERENCES:
patent: 4450041 (1984-05-01), Aklufi
patent: 4566937 (1986-01-01), Pitts
patent: 4569124 (1986-02-01), Rench et al.

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