Method of ion beam generation and an apparatus based on such met

Details Method of ion beam generation and an apparatus based on such met Method of ion beam generation and an apparatus based on such met

1984-07-13

1987-09-01

Niebling, John F.

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

2041922, 204298, 250398, 250424, 427 39, H01J 3708

Patent

active

046907440

ABSTRACT:
There is provided a method of ion beam generation wherein a plurality of opposing targets are sputtered by plasma generated in a space confined by these targets and ionized particles thereby generated are led outside of the above space in a given direction under presence of an electric field.
In connection to this method, an ion beam generator is disclosed comprising a plurality of targets, a plasma generating means to generate plasma necessary to sputter these targets in a space confined by these targets and a control electrode to lead ionized particles generated by sputtering with the above plasma outside of such space under control of their energy.

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patent: 4434038 (1984-02-01), Morrison, Jr.
patent: 4450031 (1984-05-01), Ono et al.
patent: 4481062 (1984-11-01), Kaufman et al.
patent: 4487675 (1984-12-01), Meckel

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