Method of inspecting pattern and inspecting instrument

Radiant energy – Inspection of solids or liquids by charged particles – Electron probe type

Reexamination Certificate

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Details

C250S311000

Reexamination Certificate

active

06924482

ABSTRACT:
Electron beam is irradiated to a wafer in the midst of steps at predetermined intervals by a plurality of times under a condition in which a junction becomes rearward bias and a difference in characteristic of a time period of alleviating charge in the rearward bias is monitored. As a result, charge is alleviated at a location where junction leakage is caused in a time period shorter than that of a normal portion and therefore, a potential difference is produced between the normal portion and a failed portion and is observed in a potential contrast image as a difference in brightness. By consecutively repeating operation of acquiring the image, executing an image processing in real time and storing a position and brightness of the failed portion, the automatic inspection of a designated region can be executed. Information of image, brightness and distribution of the failed portion is preserved and outputted automatically after inspection.

REFERENCES:
patent: 4575630 (1986-03-01), Lukianoff
patent: 4829243 (1989-05-01), Woodard et al.
patent: 4870344 (1989-09-01), Stille
patent: 4980639 (1990-12-01), Yoshizawa et al.
patent: 5097204 (1992-03-01), Yoshizawa et al.
patent: 5432345 (1995-07-01), Kelly
patent: 5502306 (1996-03-01), Meisburger et al.
patent: 5777327 (1998-07-01), Mizuno
patent: 6172363 (2001-01-01), Shinada et al.
patent: 6245311 (2001-06-01), Kobayashi et al.
patent: 6344750 (2002-02-01), Lo et al.
patent: 6359451 (2002-03-01), Wallmark
patent: 6465781 (2002-10-01), Nishimura et al.
patent: 6586952 (2003-07-01), Nozoe et al.
patent: 6-326165 (1994-11-01), None
patent: 11-8278 (1999-01-01), None
patent: 11-121561 (1999-04-01), None

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