Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2006-06-13
2006-06-13
Pham, Hoa Q. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S237500, C382S149000, C382S224000
Reexamination Certificate
active
07061602
ABSTRACT:
A method of inspecting a sample in which the sample is inspected under a plurality of inspection conditions and inspection data obtained by inspecting the sample under each of the plurality of inspection conditions and position information on the sample of the inspection date in correspondence with the respective inspection conditions are stored. The inspection data for each of the plurality of inspection conditions is against each other by the use of the position information on the sample to determine a position to be inspected in detail, and an image of the sample at a position to be inspected in detail is obtained. The obtained image is classified, the inspection condition of the sample by the use of information of classification of the image is determined.
REFERENCES:
patent: 5986263 (1999-11-01), Hiroi et al.
patent: 6002989 (1999-12-01), Shiba et al.
patent: 6583414 (2003-06-01), Nozoe et al.
patent: 6888959 (2005-05-01), Hamamatsu et al.
Hamamatsu Akira
Morishige Yoshio
Ninomiya Takanori
Nishiyama Hidetoshi
Noguchi Minori
Antonelli, Terry Stout and Kraus, LLP.
Hitachi , Ltd.
Hitachi High-Technologies Corporation
Pham Hoa Q.
LandOfFree
Method of inspecting a semiconductor device and an apparatus... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method of inspecting a semiconductor device and an apparatus..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method of inspecting a semiconductor device and an apparatus... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3625624