Method of inhibiting dislocation generation in silicon dendritic

Details Method of inhibiting dislocation generation in silicon dendritic Method of inhibiting dislocation generation in silicon dendritic

1989-09-22

1990-11-20

Straub, Gary P.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

156DIG80, 156DIG88, 422248, C30B 1522, C30B 1534

Patent

active

049716506

ABSTRACT:
A method of tailoring the heat balance of the outer edge of the dendrites adjacent the meniscus to produce thinner, smoother dendrites, which have substantially less dislocation sources contiguous with the dendrites, by changing the view factor to reduce radiation cooling or by irradiating the dendrites with light from a quartz lamp or a laser to raise the temperature of the dendrites.

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E. D. Jungbluth, JAP 36, No. 10, 3112 (1965).
T. N. Tucker and G. H. Schwuttke, Appl. Phys. Lett. 9, No. 6, 219 (1966).

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