Method of increasing cell retention capacity of silicon...

Details Method of increasing cell retention capacity of silicon... Method of increasing cell retention capacity of silicon...

2006-11-07

2006-11-07

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C438S014000, C438S513000, C257SE21210, C257SE21525

Reexamination Certificate

active

07132302

ABSTRACT:
A method of increasing the cell retention capacity of a silicon nitride read-only-memory on a wafer. The method includes carrying out a baking process after performing the last plasma treatment of the wafer but before a wafer sort test.

REFERENCES:
patent: 6417053 (2002-07-01), Kuo
patent: 6469342 (2002-10-01), Kuo et al.
patent: 6580630 (2003-06-01), Liu et al.
patent: 6869844 (2005-03-01), Liu et al.
patent: 6881619 (2005-04-01), Lee et al.

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