4. Semiconductor device manufacturing: process
  5. Formation of electrically isolated lateral semiconductive...
  6. Grooved and refilled with deposited dielectric material

Chen-Chin Liu

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Erase operation for use in non-volatile memory

Static information storage and retrieval – Floating gate – Particular biasing
Reexamination Certificate

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Erase operation for use in non-volatile memory

Static information storage and retrieval – Floating gate – Particular biasing
Reexamination Certificate

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High gate coupling non-volatile memory structure

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

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Memory array including isolation between memory cell and...

Active solid-state devices (e.g. – transistors – solid-state diode – Field effect device – Having insulated electrode
Reexamination Certificate

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Method for fabricating nitride read-only memory

Semiconductor device manufacturing: process – Introduction of conductivity modifying dopant into... – Ion implantation of dopant into semiconductor region
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Profile ID: LFUS-PAI-P-2149054

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