Computer-aided design and analysis of circuits and semiconductor – Nanotechnology related integrated circuit design
Reexamination Certificate
2005-04-12
2005-04-12
Garbowski, Leigh M. (Department: 2825)
Computer-aided design and analysis of circuits and semiconductor
Nanotechnology related integrated circuit design
C716S030000, C716S030000, C716S030000, C700S121000
Reexamination Certificate
active
06880135
ABSTRACT:
A method of evaluating a stepper process affected by lens aberration is provided. The method includes receiving, from a facilitator responding to a request, a set of optical models including lens aberration information, wherein the lens aberration information is difficult to extract from the optical models. A decision can be made using the set of optical models. The decision could include determining which stepper(s) can be used (or should be avoided) with a mask, a layout, a process, and/or a chemistry. The decision could include ranking a plurality of steppers based on mask data to determine the best stepper (or next best steppers) to use.
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Chang Fang-Cheng
Pierrat Christophe
Weed J. Tracy
Bever Hoffman & Harms LLP
Garbowski Leigh M.
Harms Jeanette S.
Synopsys Inc.
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