Method of in-situ particle monitoring in vacuum systems

Details Method of in-situ particle monitoring in vacuum systems Method of in-situ particle monitoring in vacuum systems

1991-11-27

1993-12-21

Williams, Hezron E.

Measuring and testing

Gas analysis

Solid content of gas

2504922, G01N 3300

Patent

active

052712648

ABSTRACT:
Detecting the presence of particles in a vacuum chamber is effected by positioning an in-situ particle monitor downstream of a pump connected to the chamber. The downstream position of the particle monitor is contrary to the normal practice of locating the particle monitor upstream of the pump, i.e. between the pump and the chamber. The invention avoids problems associated with placing the monitor immediately adjacent to the vacuum chamber, where it is subject to errors and possible surface damage caused by the process taking place in the chamber, and where it may have a lower particle detection probability.

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