Method of improving the linearity of a double-face lateral photo

Details Method of improving the linearity of a double-face lateral photo Method of improving the linearity of a double-face lateral photo

1979-04-10

1981-01-13

Massie, Jerome W.

Adhesive bonding and miscellaneous chemical manufacture

Delaminating processes adapted for specified product

Delaminating in preparation for post processing recycling step

29572, 29580, 156656, 156657, 357 55, H01L 21304, H01L 21306

Patent

active

042447593

ABSTRACT:
A method of improving the linearity of a photo detector of the kind comprising a semiconductor wafer, two resistive layers, each one covering one side of said wafer, a p-n junction separating said two layers, and one pair of electrodes on each resistive layers, each pair of electrodes defining two opposite sides of a right-angled square, whereby two portions of the resistive layers are defined, within said square. Said portions within said square are delimited electrically from the rest of said layers and the p-n junction, for instance by etching, whereby the linearity within this square is increased, and thus the useful area of the detector.

REFERENCES:
patent: 3113220 (1963-12-01), Goulding et al.
patent: 3527944 (1970-09-01), Kraner
patent: 3890178 (1975-06-01), Lebailly
patent: 4055765 (1977-10-01), Gerber et al.
patent: 4056726 (1977-11-01), Harchol

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