Method of improving post-develop photoresist profile on a...

Details Method of improving post-develop photoresist profile on a... Method of improving post-develop photoresist profile on a...

2003-11-06

2009-11-03

Cleveland, Michael (Department: 1792)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

Reexamination Certificate

active

07611758

ABSTRACT:
A method and apparatus for improving the post-development photoresist profile on a deposited dielectric film. The method includes depositing a TERA film having tunable optical and etch resistant properties on a substrate using a plasma-enhanced chemical vapor deposition process and post processing the TERA film using a plasma process. The apparatus includes a chamber having an upper electrode coupled to a first RF source and a substrate holder coupled to a second RF source; and a showerhead for providing multiple precursors and process gasses.

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