Semiconductor device manufacturing: process – Formation of semiconductive active region on any substrate – Fluid growth from gaseous state combined with subsequent...
Patent
1996-11-01
1998-01-13
Nguyen, Tuan H.
Semiconductor device manufacturing: process
Formation of semiconductive active region on any substrate
Fluid growth from gaseous state combined with subsequent...
438795, 438796, 438103, H01L 2120, H01L 2136
Patent
active
057079005
ABSTRACT:
Known MBE methods of heat-treating semiconductor crystal of a group II-group VI compound for crystal growth are accompanied by a problem of releasing the component elements during the heat-treatment to produce a coarse crystal surface that adversely affects the subsequent crystal growth steps. According to the invention, this problem is eliminated by irradiating a substrate of a group II-group VI compound, specifically ZnSe, with Zn beams and Se beams depending on the vapor pressures of the elements between the respective starting points and the respective terminating points to compensate the released Zn and Se so that consequently no oxide film is formed on the ZnSe substrate when the heat-treatment is completed to produce a plane crystal surface that is free from coarseness.
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patent: 5354708 (1994-10-01), Taskar et al.
patent: 5433170 (1995-07-01), Toda et al.
patent: 5492080 (1996-02-01), Ohkawa et al.
Kawaguchi Keizo
Sano Michihiro
Nguyen Tuan H.
Stanley Electric Co. Ltd.
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